The Effects of Thermal History during Growth on O Precipitation in Czochralski Silicon

G. Fraundorf; P. Fraundorf; R. A. Craven; R. A. Frederick; J. W. Moody; R. W. Shaw

doi:10.1149/1.2114194

The Effects of Thermal History during Growth on O Precipitation in Czochralski Silicon

G. Fraundorf
, P. Fraundorf
, R. A. Craven
, R. A. Frederick
, J. W. Moody
, R. W. Shaw

University of Missouri-St. Louis

Research output: Contribution to journal › Article › peer-review

Original language	American English
Journal	Journal of The Electrochemical Society
Volume	132
DOIs	https://doi.org/10.1149/1.2114194
State	Published - Jan 1 1985

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Mineral Physics

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@article{b4a46904856846a98a88f2fe71fee23e,

title = "The Effects of Thermal History during Growth on O Precipitation in Czochralski Silicon",

author = "G. Fraundorf and P. Fraundorf and Craven, \{R. A.\} and Frederick, \{R. A.\} and Moody, \{J. W.\} and Shaw, \{R. W.\}",

note = "1 Monsanto Electronic Materials Company, St. Louis, Missouri 63167 High oxygen wafers from 100 mm diam Si crystals grown by the Czochralski process, but subjected to three different thermal histories in an experimental puller, were examined by Wright etching, transmission electron microscopy, and Fourier transform infrared spectroscopy after wafer heat‐treatments at , and .",

year = "1985",

month = jan,

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doi = "10.1149/1.2114194",

language = "American English",

volume = "132",

journal = "Journal of The Electrochemical Society",

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T1 - The Effects of Thermal History during Growth on O Precipitation in Czochralski Silicon

AU - Fraundorf, G.

AU - Fraundorf, P.

AU - Craven, R. A.

AU - Frederick, R. A.

AU - Moody, J. W.

AU - Shaw, R. W.

N1 - 1 Monsanto Electronic Materials Company, St. Louis, Missouri 63167 High oxygen wafers from 100 mm diam Si crystals grown by the Czochralski process, but subjected to three different thermal histories in an experimental puller, were examined by Wright etching, transmission electron microscopy, and Fourier transform infrared spectroscopy after wafer heat‐treatments at , and .

PY - 1985/1/1

Y1 - 1985/1/1

UR - http://jes.ecsdl.org/cgi/doi/10.1149/1.2114194

U2 - 10.1149/1.2114194

DO - 10.1149/1.2114194

M3 - Article

VL - 132

JO - Journal of The Electrochemical Society

JF - Journal of The Electrochemical Society

ER -

The Effects of Thermal History during Growth on O Precipitation in Czochralski Silicon

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