Microhardness study of amorphous hydrogenated boron carbide deposited on a cathode substrate by plasma deposition

Shu‐Han Lin, Bernard J. Feldman, Dong Li

Research output: Contribution to journal › Article › peer-review

Disciplines

@article{e8298d888fe74c0b9b7b5dfe81812a42,

title = "Microhardness study of amorphous hydrogenated boron carbide deposited on a cathode substrate by plasma deposition",

author = "Shu‐Han Lin and Feldman, \{Bernard J.\} and Dong Li",

year = "1996",

month = oct,

day = "14",

doi = "10.1063/1.117641",

language = "American English",

volume = "69",

journal = "Applied Physics Letters",

}

TY - JOUR

T1 - Microhardness study of amorphous hydrogenated boron carbide deposited on a cathode substrate by plasma deposition

AU - Lin, Shu‐Han

AU - Feldman, Bernard J.

AU - Li, Dong

PY - 1996/10/14

Y1 - 1996/10/14

UR - http://aip.scitation.org/doi/full/10.1063/1.117641

U2 - 10.1063/1.117641

DO - 10.1063/1.117641

M3 - Article

VL - 69

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -