Infra red quantum dot photolithography

R. R. Gadipalli; L. A. Martin; B. Heckman; J. G. Story; M. F. Bertino; P. Fraundorf; S. Guha; N. Leventis

doi:10.1007/s10971-006-9120-1

Infra red quantum dot photolithography

R. R. Gadipalli, L. A. Martin, B. Heckman, J. G. Story, M. F. Bertino, P. Fraundorf, S. Guha, N. Leventis

University of Missouri-St. Louis

Research output: Contribution to journal › Article › peer-review

Original language	American English
Journal	Journal of Sol-Gel Science and Technology
Volume	40
DOIs	https://doi.org/10.1007/s10971-006-9120-1
State	Published - Jan 10 2006

Disciplines

Materials Science and Engineering
Inorganic Chemistry

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@article{ea0823b8547c4e9faaa84d86f463358f,

title = "Infra red quantum dot photolithography",

author = "Gadipalli, {R. R.} and Martin, {L. A.} and B. Heckman and Story, {J. G.} and Bertino, {M. F.} and P. Fraundorf and S. Guha and N. Leventis",

note = "CdS quantum dots were fabricated photolithographically on the surface and in the bulk of silica hydrogels, as well as on the surface of planar substrates. Silica hydrogels were prepared with a standard base-catalyzed route, and the solvent was exchanged with a cold aqueous solution of Cd(NO 3) 2, NH 4 OH, thiourea, and a capping agent, e.g., 2-mercaptoethanol.",

year = "2006",

month = jan,

day = "10",

doi = "10.1007/s10971-006-9120-1",

language = "American English",

volume = "40",

journal = "Journal of Sol-Gel Science and Technology",

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TY - JOUR

T1 - Infra red quantum dot photolithography

AU - Gadipalli, R. R.

AU - Martin, L. A.

AU - Heckman, B.

AU - Story, J. G.

AU - Bertino, M. F.

AU - Fraundorf, P.

AU - Guha, S.

AU - Leventis, N.

N1 - CdS quantum dots were fabricated photolithographically on the surface and in the bulk of silica hydrogels, as well as on the surface of planar substrates. Silica hydrogels were prepared with a standard base-catalyzed route, and the solvent was exchanged with a cold aqueous solution of Cd(NO 3) 2, NH 4 OH, thiourea, and a capping agent, e.g., 2-mercaptoethanol.

PY - 2006/1/10

Y1 - 2006/1/10

UR - https://link.springer.com/content/pdf/10.1007%2Fs10971-006-9120-1.pdf

U2 - 10.1007/s10971-006-9120-1

DO - 10.1007/s10971-006-9120-1

M3 - Article

VL - 40

JO - Journal of Sol-Gel Science and Technology

JF - Journal of Sol-Gel Science and Technology

ER -

Infra red quantum dot photolithography

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