An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)

L. Mule'stagno; D.E. Hill; R. Standley; M. Olmo; J.C. Holzer; R. Falster; P. Fraundorf

doi:10.1557/PROC-510-627

An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)

L. Mule'stagno
, D.E. Hill
, R. Standley
, M. Olmo
, J.C. Holzer
, R. Falster
, P. Fraundorf

University of Missouri-St. Louis

Research output: Contribution to journal › Article › peer-review

Original language	American English
Journal	MRS Proceedings
Volume	510
DOIs	https://doi.org/10.1557/PROC-510-627
State	Published - Jan 1 1998

Disciplines

Materials Science and Engineering
Analytical Chemistry

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@article{9f412da132ef43b0963c7f077b595a99,

title = "An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)",

author = "L. Mule'stagno and D.E. Hill and R. Standley and M. Olmo and J.C. Holzer and R. Falster and P. Fraundorf",

note = "The Optical Precipitate Profiler (OPP) and similar instruments are establishing themselves as routine techniques for measuring bulk micro-defect density (BMD) and denuded zone depths in semiconductor wafers. This task has traditionally been done by means of the cleave-and-etch technique in which defects are counted on a cleaved edge of an etched wafer using an optical microscope.",

year = "1998",

month = jan,

day = "1",

doi = "10.1557/PROC-510-627",

language = "American English",

volume = "510",

journal = "MRS Proceedings",

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TY - JOUR

T1 - An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)

AU - Mule'stagno, L.

AU - Hill, D.E.

AU - Standley, R.

AU - Olmo, M.

AU - Holzer, J.C.

AU - Falster, R.

AU - Fraundorf, P.

N1 - The Optical Precipitate Profiler (OPP) and similar instruments are establishing themselves as routine techniques for measuring bulk micro-defect density (BMD) and denuded zone depths in semiconductor wafers. This task has traditionally been done by means of the cleave-and-etch technique in which defects are counted on a cleaved edge of an etched wafer using an optical microscope.

PY - 1998/1/1

Y1 - 1998/1/1

UR - http://journals.cambridge.org/abstract_S1946427400231680

U2 - 10.1557/PROC-510-627

DO - 10.1557/PROC-510-627

M3 - Article

VL - 510

JO - MRS Proceedings

JF - MRS Proceedings

ER -

An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)

Disciplines

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