An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)

L. Mule'stagno; D.E. Hill; R. Standley; M. Olmo; J.C. Holzer; R. Falster; P. Fraundorf

doi:10.1557/PROC-510-627

An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)

L. Mule'stagno, D.E. Hill, R. Standley, M. Olmo, J.C. Holzer, R. Falster, P. Fraundorf

University of Missouri-St. Louis

Research output: Contribution to journal › Article › peer-review

Original language	American English
Journal	MRS Proceedings
Volume	510
DOIs	https://doi.org/10.1557/PROC-510-627
State	Published - Jan 1 1998

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Materials Science and Engineering
Analytical Chemistry

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@article{9f412da132ef43b0963c7f077b595a99,

title = "An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)",

author = "L. Mule'stagno and D.E. Hill and R. Standley and M. Olmo and J.C. Holzer and R. Falster and P. Fraundorf",

note = "The Optical Precipitate Profiler (OPP) and similar instruments are establishing themselves as routine techniques for measuring bulk micro-defect density (BMD) and denuded zone depths in semiconductor wafers. This task has traditionally been done by means of the cleave-and-etch technique in which defects are counted on a cleaved edge of an etched wafer using an optical microscope.",

year = "1998",

month = jan,

day = "1",

doi = "10.1557/PROC-510-627",

language = "American English",

volume = "510",

journal = "MRS Proceedings",

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TY - JOUR

T1 - An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)

AU - Mule'stagno, L.

AU - Hill, D.E.

AU - Standley, R.

AU - Olmo, M.

AU - Holzer, J.C.

AU - Falster, R.

AU - Fraundorf, P.

N1 - The Optical Precipitate Profiler (OPP) and similar instruments are establishing themselves as routine techniques for measuring bulk micro-defect density (BMD) and denuded zone depths in semiconductor wafers. This task has traditionally been done by means of the cleave-and-etch technique in which defects are counted on a cleaved edge of an etched wafer using an optical microscope.

PY - 1998/1/1

Y1 - 1998/1/1

UR - http://journals.cambridge.org/abstract_S1946427400231680

U2 - 10.1557/PROC-510-627

DO - 10.1557/PROC-510-627

M3 - Article

VL - 510

JO - MRS Proceedings

JF - MRS Proceedings

ER -

An Investigation of the Limit of Detection and the Scattering Dependence of the Optical Precipitate Profiler (OPP)

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